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Correo electrónico
marketing@dymek.com
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Teléfono
13917837832
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Dirección
Room 306-308, Building 6, No. 35, Lane 2216, Jingao Road, Pudong, Shanghai
Categorías de producto
Daimei Instrument Technology Service (Shanghai) Co., Ltd
Plasma enhanced chemical vapor deposition (PECVD) system
NegociableActualización en12/23
- modelo
- Naturaleza del fabricante
- Productores
- Categoría de producto
- Lugar de origen
Descripción general
Vision 410 Plasma Enhanced Chemical Vapor Deposition (PECVD) System - Continuation of PTI 790+Series, Continuing Successful Experience in Serving Diversified Markets
Detalles del producto
1. Flexible sedimentation ability
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Silicon based deposition process-Oxide, nitride, oxynitride, amorphous silicon（a-Si）、Silicon carbide（SiC）
·Research and Development
·prototyping
·Small batch production-PhotonicsSolid state lightingTheMEMSAnd nanotechnology
·Application areas: interlayer insulation layer, passivation layer, encapsulation layer, mask layer, anti reflection layer
2. Performance value
1. Large manual loading platform(406mm)
2. Excellent cleanliness
3. Highuniformity
4.High throughput
5. Reliable software
6.Compact footprint
7.Cost effective
8.easy to maintain
9.Adopting industry-leading components
3. Verified solutions
·Continued itPTI 790/790+The design concept
oManual loading, no load lock required (supports batch or single wafer)
oInstalled more than400Set system
oSimple technology and sturdy structure Competitive price and reliable quality
Compact footprint, saving space
